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Evaluation and Application of 600 V GaN HEMT in Cascode Structure

机译:级联结构中600 V GaN HEMT的评估和应用

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Gallium nitride high electron mobility transistor (GaN HEMT) has matured dramatically over the last few years. A progressively larger number of GaN devices have been manufactured for in field applications ranging from low power voltage regulators to high power infrastructure base-stations. Compared to the state-of-the-art silicon MOSFET, GaN HEMT has a much better figure of merit and shows potential for high-frequency applications. The first generation of 600 V GaN HEMT is intrinsically normally on device. To easily apply normally on GaN HEMT in circuit design, a low-voltage silicon MOSFET is in series to drive the GaN HEMT, which is well known as cascode structure. This paper studies the characteristics and operation principles of a 600 V cascode GaN HEMT. Evaluations of the cascode GaN HEMT performance based on buck converter at hard-switching and soft-switching conditions are presented in detail. Experimental results prove that the cascode GaN HEMT is superior to the silicon MOSFET, but it still needs soft-switching in high-frequency operation due to considerable package and layout parasitic inductors and capacitors. The cascode GaN HEMT is then applied to a 1 MHz 300 W 400 V/12 V LLC converter. A comparison of experimental results with a state-of-the-art silicon MOSFET is provided to validate the advantages of the GaN HEMT.
机译:氮化镓高电子迁移率晶体管(GaN HEMT)在最近几年中已显着成熟。从低功率稳压器到高功率基础设施基站,越来越多的GaN器件已用于现场应用。与最新的硅MOSFET相比,GaN HEMT具有更好的品质因数,并显示出在高频应用中的潜力。第一代600 V GaN HEMT本质上通常在器件上。为了在电路设计中轻松正常地将其应用于GaN HEMT,需要串联一个低压硅MOSFET来驱动GaN HEMT,这就是众所周知的共源共栅结构。本文研究了600 V级联GaN HEMT的特性和工作原理。详细介绍了基于降压转换器在硬开关和软开关条件下的共源共栅GaN HEMT性能的评估。实验结果证明,共源共栅GaN HEMT优于硅MOSFET,但由于存在大量封装和布局的寄生电感器和电容器,因此在高频工作中仍需要软开关。然后将共源共栅GaN HEMT应用于1 MHz 300 W 400 V / 12 V LLC转换器。将实验结果与最新的硅MOSFET进行了比较,以验证GaN HEMT的优势。

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