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Towards Wafer Scale Inductive Determination of Magnetostatic and Dynamic Parameters of Magnetic Thin Films and Multilayers

机译:晶圆尺寸感应法测定磁性薄膜和多层膜的静磁和动态参数

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摘要

We investigate an inductive probe head suitable for noninvasive characterization of the magnetostatic and dynamic parameters of magnetic thin films and multilayers on the wafer scale. The probe is based on a planar waveguide with rearward high frequency connectors that can be brought in close contact to the wafer surface. Inductive characterization of the magnetic material is carried out by vector network analyzer ferromagnetic resonance. Analysis of the field dispersion of the resonance allows the determination of key material parameters such as the saturation magnetization ${M}_{S}$ or the effective damping parameter $a_{eff}$. Three waveguide designs are tested. The broadband frequency response is characterized and the suitability for inductive determination of ${M}_{S}$ and $a_{eff}$ is compared. Integration of such probes in a wafer prober could in the future allow wafer scale in-line testing of magnetostatic and dynamic key material parameters of magnetic thin films and multilayers.
机译:我们研究了一种感应式探头,该探头适用于在晶片规模上对磁性薄膜和多层薄膜的静磁和动态参数进行无创表征。探针基于带有向后高频连接器的平面波导,可以使其与晶片表面紧密接触。磁性材料的电感特性可通过矢量网络分析仪铁磁谐振进行。通过分析共振场的色散,可以确定关键的材料参数,例如饱和磁化强度 $ {M} _ {S} $ < / formula>或有效阻尼参数 $ a_ {eff} $ 。测试了三种波导设计。表征宽带频率响应,并适合归纳确定<公式公式类型=“ inline”> $ {M} _ {S} $ 和<公式公式类型比较=“ inline”> $ a_ {eff} $ 。将来将这种探针集成到晶圆探测器中,可以对磁性薄膜和多层材料的静磁和动态关键材料参数进行晶圆级在线测试。

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