首页> 外文期刊>Magnetics, IEEE Transactions on >The Critical Current Density of ${rm GdBa}_{2}{rm Cu}_{3}{rm O}_{7-delta}$ Superconducting Films: Thickness, Temperature, and Field Dependences
【24h】

The Critical Current Density of ${rm GdBa}_{2}{rm Cu}_{3}{rm O}_{7-delta}$ Superconducting Films: Thickness, Temperature, and Field Dependences

机译:$ {rm GdBa} _ {2} {rm Cu} _ {3} {rm O} _ {7-delta} $超导膜的临界电流密度:厚度,温度和场相关性

获取原文
获取原文并翻译 | 示例
           

摘要

The critical current density $(J_{c})$ of pulsed-laser-deposited ${rm GdBa}_{2}{rm Cu}_{3}{rm O}_{7-delta}$ (GdBCO) superconducting films with film thickness $(d)$ ranging from 0.2 to 1.5 $mu{rm m}$ was studied as functions of temperature $(T)$ and field $(H)$ . A thickness dependence of both the self-field and the in-field $J_{c}{rm s}$ at 77 K showed that the $J_{c}{rm s}$ were observed to decrease with increasing film thickness as an expression of $J_{c}sim d^{-1/2}$ , which was predicted by the collective pinning theory of uncorrelated defects. However, the in-field $J_{c}$ at $dsim 0.6~mu{rm m}$ was found to suddenly increase in the general trend of decreasing $J_{c}-d$ , which probably suggested a change in the pinning mechanism at that film thickness. The temperature dependence of the in-field $J_{c}$ in the GdBCO films was specifically studied at the low and the intermediate-field regions. A characteristic field H* separating the field-independent and the field-dependent $J_{c}$ regions was found to decrease with increasing both $T$ and $d$ . The value of $alpha$ of the $J_{c}sim H^{alpha}$ dependence in the intermediate-field region was estimated to be $alphasim 0.48$ –0.52 for both the thin- and the thick-film regions, which is similar to the theoretical value of $alpha=0.5$ for pinning by sparse point-like defects in ${rm REBa}_{2}{rm Cu}_{3}{rm O}_{7-delta}$ (RE: rare-earth elements) superconducting films. The value of $alphasim 0.35$ estimated for the 0.6 $mu{rm m}$ thick GdBCO film might suggest that effective pinning induced via nanosized dislocations formed on the surface of the GdBCO film. Based on the application of the theoretical models, it could be concluded that the dominant pinning mechanism in the GdBCO films is pinning by sparse uncorrelated defects.
机译:脉冲激光沉积$ {rm GdBa} _ {2} {rm Cu} _ {3} {rm O} _ {7-δ} $(GdBCO)超导的临界电流密度$(J_ {c})$研究了膜厚度$(d)$在0.2到1.5 $ mu {rm m} $范围内的膜作为温度$(T)$和场$(H)$的函数。在77 K时自场和场内$ J_ {c} {rm s} $的厚度依赖性表明,随着膜厚的增加,观察到$ J_ {c} {rm s} $随膜厚的增加而减小。 $ J_ {c} sim d ^ {-1/2} $的表达式,这是由不相关缺陷的集体钉扎理论预测的。然而,发现在$ dsim 0.6〜mu {rm m} $的田间$ J_ {c} $突然以$ J_ {c} -d $减少的总体趋势突然增加,这可能表明固定在该膜厚的机制。在低场和中场区域,专门研究了GdBCO薄膜中场内$ J_ {c} $的温度依赖性。发现将与场无关和与场有关的$ J_ {c} $区域分开的特征场H *随着$ T $和$ d $的增加而减小。对于薄膜和厚膜区域,中间场区域的$ J_ {c} sim H ^ {alpha} $依赖性的$ alpha $的值估计为$ alphasim 0.48 $ –0.52。与$ {rm REBa} _ {2} {rm Cu} _ {3} {rm O} _ {7-delta} $中的稀疏点状缺陷进行钉扎的$ alpha = 0.5 $的理论值相似( RE:稀土元素)超导膜。对于0.6微米厚的GdBCO薄膜,估计的alphasim 0.35美元的值可能表明,通过在GdBCO薄膜表面形成的纳米级位错引起的有效钉扎。根据理论模型的应用,可以得出结论,GdBCO薄膜的主要钉扎机制是由稀疏的不相关缺陷钉扎。

著录项

相似文献

  • 外文文献
  • 中文文献
  • 专利
获取原文

客服邮箱:kefu@zhangqiaokeyan.com

京公网安备:11010802029741号 ICP备案号:京ICP备15016152号-6 六维联合信息科技 (北京) 有限公司©版权所有
  • 客服微信

  • 服务号