GMR in corrugated Co/Cu multilayers

摘要

A new corrugated material comprising antiferromagnetically coupled Co/Cu multilayers was prepared using V-grooved Si substrates. Scanning electron microscopy and X-ray diffraction observations indicate that the corrugated multilayers were successfully grown with the formation of smooth and clear interfaces. Magnetoresistance change with the sense current normal to the grooves was larger than that with the current parallel to the grooves. The MR enhancement due to the difference in measurement geometry increased as the width of the grooves decreased.