GaN Nanowires Grown by Molecular Beam Epitaxy

摘要

The unique properties of GaN nanowires grown by molecular beam epitaxy are reviewed. These properties include the absence of residual strain, exclusion of most extended defects, long photoluminescence lifetime, low surface recombination velocity, and high mechanical quality factor. The high purity of the nanowires grown by this method allows for controllable n-type doping. P-type doping presents more challenges but has been demonstrated in active light-emitting diode devices. The present understanding of nucleation and growth of these materials is also reviewed.