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MMIC yield optimisation by design centring and off-chip controllers

机译:通过设计居中和片外控制器来优化MMIC产量

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摘要

The use of short-length III-V technologies is required to design circuits for microwave and millimetre-wave applications showing state-of-the-art performance. The parameter dispersion of such processes requires design techniques to achieve the best trade-off between performance and yield. External control of MMIC bias, based on process parameters estimation, allows yield enhancement even when design centring or feedback-based controls are not effective. A methodology to perform yield-oriented design of MMICs in III-V technologies is proposed. A set of on-chip circuits is used to estimate the value of process parameters; an external controller corrects the bias point in order to achieve the design centring in a parameter region around the estimated values. The proposed technique corrects circuit performance in the presence of parameter values belonging to the distribution tail, where standard techniques fail. The design centring approach and a distance-dependent correlated statistical model of HEMTs are used to design the external controller. The proposed methodology has been applied to design both a transimpedance amplifier and a distributed amplifier for multi-gigabit applications, showing a yield improvement of more than 10% with respect to the design centring approach, and encouraging the use of the proposed methodology for circuit design with short-length III-V technologies.
机译:需要使用短长度的III-V技术来设计用于微波和毫米波应用的电路,以显示出最先进的性能。这种工艺的参数分散要求设计技术来实现性能和良率之间的最佳权衡。即使在设计居中或基于反馈的控制无效的情况下,基于工艺参数估计的MMIC偏置的外部控制也可以提高产量。提出了一种在III-V技术中进行MMIC的面向产量设计的方法。一组片上电路用于估计过程参数的值。外部控制器校正偏置点,以使设计以估计值周围的参数区域为中心。所提出的技术在存在属于分布尾部的参数值的情况下校正电路性能,而标准技术则失败了。 HEMT的设计对中方法和距离相关的相关统计模型用于设计外部控制器。拟议的方法已应用于设计用于多千兆位应用的跨阻放大器和分布式放大器,相对于设计居中方法而言,良率提高了10%以上,并鼓励将拟议的方法用于电路设计使用短距离III-V技术。

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