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Sorption and Redox Reactions of As(Ⅲ) and As(V) within Secondary Mineral Coatings on Aquifer Sediment Grains

机译:含水沉积物颗粒在次生矿物膜层中As(Ⅲ)和As(V)的吸附和氧化还原反应

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摘要

Important reactive phenomena that affect the transport and rate of many elements occur at the mineral-water interface (MWI), including sorption and redox reactions. Fundamental knowledge of these phenomena are often based on observations of ideal mineral-water systems, for example, studies of molecular scale reactions on single crystal faces or the surfaces of pure mineral powders. Much less is understood about MWI in natural environments, which typically have nanometer to micrometer scale secondary mineral coatings on the surfaces of primary mineral grains. We examined sediment grain coatings from a well-characterized field site to determine the causes of rate limitations for arsenic (As) sorption and redox processes within the coatings. Sediments were obtained from the USGS field research site on Cape Cod, MA, and exposed to synthetic contaminated groundwater solutions. Uptake of As(Ⅲ) and As(V) into the coatings was studied with a combination of electron microscopy and synchrotron techniques to assess concentration gradients and reactive processes, including electron transfer reactions. Transmission electron microscopy (TEM) and X-ray microprobe (XMP) analyses indicated that As was primarily associated with micrometer- to submicrometer aggregates of Mn-bearing nanoparticulate goethite. As(Ⅲ) oxidation by this phase was observed but limited by the extent of exposed surface area of the goethite grains to the exterior of the mineral coatings. Secondary mineral coatings are potentially both sinks and sources of contaminants depending on the history of a contaminated site, and may need to be included explicitly in reactive transport models.
机译:在矿物质水界面(MWI)上会发生影响许多元素迁移和速率的重要反应现象,包括吸附和氧化还原反应。这些现象的基础知识通常基于理想矿泉水系统的观察结果,例如,对单晶表面或纯矿物粉末表面上的分子尺度反应的研究。人们对自然环境下的MWI知之甚少,自然环境通常在一次矿物晶粒的表面上具有纳米至微米级的二次矿物涂层。我们检查了一个特征明确的现场站点的沉积物颗粒涂层,以确定涂层中砷(As)吸附和氧化还原过程速率限制的原因。沉积物从位于马萨诸塞州科德角的USGS现场研究地点获得,并暴露于合成污染的地下水溶液中。结合电子显微镜和同步加速器技术研究了涂层中As(Ⅲ)和As(V)的吸收,以评估浓度梯度和反应过程,包括电子转移反应。透射电子显微镜(TEM)和X射线微探针(XMP)分析表明,As主要与含Mn纳米针铁矿的微米级至亚微米级聚集体有关。观察到该相的As(Ⅲ)氧化,但受到针铁矿晶粒暴露于矿物涂层外部的表面积的限制。根据受污染地点的历史,次要矿物涂层可能既是汇又是污染物的来源,并且可能需要明确地包含在反应性运输模型中。

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  • 来源
    《Environmental Science & Technology》 |2013年第20期|11569-11576|共8页
  • 作者单位

    Earth Sciences Division, Lawrence Berkeley National Laboratory, 1 Cyclotron Road, Berkeley, California 94720, United States Department of Geology, Kent State University;

    Department of Geology, Kent State University;

    Materials Sciences Division, Lawrence Berkeley National Laboratory, 1 Cyclotron Road, Berkeley, California 94720, United States;

    Advanced Light Source, Lawrence Berkeley National Laboratory, 1 Cyclotron Road, Berkeley, California 94720, United States;

    Department of Geology, Kent State University;

  • 收录信息 美国《科学引文索引》(SCI);美国《工程索引》(EI);美国《生物学医学文摘》(MEDLINE);美国《化学文摘》(CA);
  • 原文格式 PDF
  • 正文语种 eng
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