首页> 外文期刊>Electron Devices, IEEE Transactions on >Compact Modeling of Partially Depleted Silicon-on-Insulator Drain-Extended MOSFET (DEMOSFET) Including High-Voltage and Floating-Body Effects
【24h】

Compact Modeling of Partially Depleted Silicon-on-Insulator Drain-Extended MOSFET (DEMOSFET) Including High-Voltage and Floating-Body Effects

机译:包括高压和浮体效应的部分耗尽型绝缘体上硅漏极扩展MOSFET(DEMOSFET)的紧凑模型

获取原文
获取原文并翻译 | 示例
           

摘要

In this paper, a scalable compact model for partially depleted silicon-on-insulator drain-extended MOSFETs (PD SOI DEMOSFETs) is developed using a subcircuit approach. The proposed compact model captures the special direct-current behavior of a PD SOI DEMOSFET transistor. Our model accounts for high-voltage effects such as quasi-saturation and impact ionization in the drift region, along with a floating-body effect such as the kink effect in the output characteristics of the floating-body PD SOI DEMOSFET transistor. In the subcircuit approach used, the channel region is modeled using the BSIM4SOI model, and the drift region is modeled using a bias-dependent resistance model, along with a current-controlled current source. The model is validated for a set of channel and drift lengths to demonstrate the scalability of the model. The accuracy of the proposed compact model is verified using 2-D numerical simulations.
机译:在本文中,使用子电路方法开发了一种用于部分耗尽绝缘体上硅的漏极扩展MOSFET(PD SOI DEMOSFET)的可扩展紧凑模型。所提出的紧凑模型捕获了PD SOI DEMOSFET晶体管的特殊直流行为。我们的模型考虑了漂移区中的准饱和和冲击电离等高电压效应,以及诸如浮体PD SOI DEMOSFET晶体管输出特性中的扭结效应之类的浮体效应。在所使用的子电路方法中,使用BSIM4SOI模型对沟道区域进行建模,并使用与偏置相关的电阻模型以及电流控制电流源对漂移区域进行建模。针对一组信道和漂移长度对模型进行了验证,以证明模型的可伸缩性。使用二维数值模拟验证了所提出的紧凑模型的准确性。

著录项

相似文献

  • 外文文献
  • 中文文献
  • 专利
获取原文

客服邮箱:kefu@zhangqiaokeyan.com

京公网安备:11010802029741号 ICP备案号:京ICP备15016152号-6 六维联合信息科技 (北京) 有限公司©版权所有
  • 客服微信

  • 服务号