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首页> 外文期刊>Electron Devices, IEEE Transactions on >Part I: Physical Insight Into Carbon-Doping-Induced Delayed Avalanche Action in GaN Buffer in AlGaN/GaN HEMTs
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Part I: Physical Insight Into Carbon-Doping-Induced Delayed Avalanche Action in GaN Buffer in AlGaN/GaN HEMTs

机译:第一部分:对AlGaN / GaN HEMT中GaN缓冲液中碳掺杂引起的延迟雪崩作用的物理观察

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摘要

Physics behind the improvement in breakdown voltage of AlGaN/GaN HEMTs with carbon-doping of GaN buffer is discussed. Modeling of carbon as acceptor traps and self-compensating acceptor/donor traps is discussed with respect to their impact on avalanche breakdown. Impact of carbon behaving as a donor as well as acceptor traps on electric field relaxation and avalanche generation is discussed in detail to establish the true nature of carbon in GaN that delays the avalanche action. This understanding of the behavior of carbon-doping in GaN buffer is then utilized to discuss design parameters related to carbon doped buffer. Design parameters such as undoped channel thickness and relative trap concentration induced by carbon-doping are discussed with respect to the performance metrics of breakdown voltage, leakage current, sheet charge density, and dynamic ON-resistance.
机译:讨论了通过掺杂GaN缓冲剂来改善AlGaN / GaN HEMT的击穿电压的物理原理。讨论了碳作为受体陷阱和自补偿受体/供体陷阱对雪崩击穿的影响的建模。详细讨论了碳作为供体和受体陷阱的行为对电场弛豫和雪崩产生的影响,以建立GaN中碳的真实性质,从而延迟雪崩作用。然后利用对GaN缓冲器中碳掺杂行为的了解来讨论与碳掺杂缓冲器有关的设计参数。结合击穿电压,漏电流,薄层电荷密度和动态导通电阻的性能指标,讨论了设计参数,例如未掺杂的沟道厚度和碳掺杂引起的相对陷阱浓度。

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