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首页> 外文期刊>IEEE Electron Device Letters >High-Power P-i-N Diode With Local Lifetime Control Using Palladium Diffusion Controlled by Radiation Defects
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High-Power P-i-N Diode With Local Lifetime Control Using Palladium Diffusion Controlled by Radiation Defects

机译:高功率P-i-N二极管,使用受辐射缺陷控制的钯扩散,实现局部寿命控制

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摘要

We demonstrate for the first time a high-power P-i-N diode with local lifetime control using palladium (Pd) diffusion. Low-temperature (600℃-700℃) diffusion of Pd is stimulated by radiation defects resulting from alpha-particle irradiation (4{sup left}He{sup}(2+): 10 MeV, 10{sup}12 cm{sup}(-2)). The region of maximal radiation damage of Gaussian shape is decorated by substitutional Pd after diffusion from a palladium silicide surface layer through the P{sup}+-P region into the N-base close to the anode junction. Significantly lower leakage current compared to that of standard 4{sup left}He{sup}(2+) irradiation and very good ruggedness under fast recovery (di/dt ≈ 500 A/μs, V{sub}R ≈ 2 kV) is demonstrated for Pd diffusion at 600℃.
机译:我们首次展示了使用钯(Pd)扩散进行局部寿命控制的大功率P-i-N二极管。 Pd的低温(600℃-700℃)扩散受到α粒子辐照引起的辐射缺陷的刺激(4 {sup left} He {sup}(2 +):10 MeV,10 {sup} 12 cm {sup }(-2))。在从硅化钯表面层通过P {sup} +-P区域扩散到靠近阳极结的N基极后,高斯形状的最大辐射损伤区域由置换Pd装饰。与标准4 {sup left} He {sup}(2+)辐射相比,泄漏电流明显更低,并且在快速恢复(di / dt≈500 A /μs,V {sub} R≈2 kV)下具有非常好的坚固性证明了Pd在600℃时的扩散。

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