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Silicon and its application method effects on modulation of cadmium stress responses in Triticum aestivum (L.) through improving the antioxidative defense system and polyamine gene expression

机译:硅及其应用方法通过改善抗氧化防御系统和多胺基因表达来调节小麦对镉胁迫的响应

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Identification of the optimum application method of exogenous supports for crop plants to improve their growth under environmental stresses such as heavy metals represents key priorities for researchers worldwide. Influences of different application methods of silicon (Si; 3 mM); soil treatment, foliar spray and seed soaking on growth, chlorophyll fluorescence, photosynthetic gas exchange, cell membrane injury, osmoprotectants contents, antioxidative defense system activity, and polyamines contents and their gene expression in wheat plants grown under normal and 2 mM cadmium (Cd) stress conditions were investigated in 3-repeated pot experiment. Cd stress severely depressed growth, chlorophyll fluorescence, photosynthetic gas exchange, tissue health, water use efficiency (WUE) and Si content, and elevated osmoprotectants and Cd2+ contents, antioxidative defense system activity, and polyamines contents and their gene expression. However, Si in different application methods alleviated the Cd stress effects and significantly reduced Cd2+ and MDA contents and electrolyte leakage, significantly increased growth, chlorophyll fluorescence, photosynthetic gas exchange, WUE, membrane stability index, relative water content and Si content, and further increased proline and soluble sugars contents, antioxidative (enzymatic and non-enzymatic) defense system activity, and polyamines contents and their gene expression. Among the three methods, Si applied as soil addition was the best and most effective in alleviating the Cd stress effects.
机译:为世界范围内的研究人员确定在环境胁迫下(例如重金属)改善作物生长的外源支持物的最佳施用方法是其首要任务。硅(Si; 3 mM)的不同施用方法的影响;土壤处理,叶面喷雾和浸种对正常和2 mM镉(Cd)下生长的小麦植物的生长,叶绿素荧光,光合气体交换,细胞膜损伤,渗透保护剂含量,抗氧化防御系统活性以及多胺含量及其基因表达在3次重复盆实验中研究了应力条件。 Cd胁迫严重抑制了生长,叶绿素荧光,光合气体交换,组织健康,水分利用效率(WUE)和Si含量,以及渗透保护剂和Cd2 +含量,抗氧化防御系统活性以及多胺含量及其基因表达的升高。然而,硅在不同的施用方式下减轻了镉胁迫的影响,并显着降低了Cd2 +和MDA的含量和电解质的泄漏,显着增加了生长,叶绿素荧光,光合气体交换,WUE,膜稳定性指数,相对水含量和Si含量,并进一步增加脯氨酸和可溶性糖含量,抗氧化(酶和非酶)防御系统活性以及多胺含量及其基因表达。在这三种方法中,添加硅作为减轻土壤中Cd胁迫效果的最佳方法。

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