首页> 外文期刊>International Journal of Electrochemical Science >Electrochemical Properties and Thin-Film Morphology of Mn- doped TiO2?Thin Layer Prepared by Electrodeposition Technique and Its application as photocatalyst for Rhodamine B degradation
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Electrochemical Properties and Thin-Film Morphology of Mn- doped TiO2?Thin Layer Prepared by Electrodeposition Technique and Its application as photocatalyst for Rhodamine B degradation

机译:通过电沉积技术制备的Mn-掺杂TiO2的电化学性能和薄膜形态及其作为罗丹明B降解光催化剂的应用及其应用

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This studywas conducted to investigate the Mn concentration effect as dopant on morphological, structural, electrochemical and photocatalytic properties of Mn-doped TiO2 thin films.The pure TiO2 and Mn-doped TiO2 thin films were synthesized through electrodeposition method and XRD, SEM, electrochemical and photodegradation analyses were applied for characterization of synthesized thin films. XRD results showed the pure TiO2 and Mn-doped TiO2 thin films were deposited in anatase phase of TiO2 and TiO2 nanocrystal sizes were slightly decreased with the increasing of dopant concentration. SEM analysis showed that the pure TiO2 and Mn-doped TiO2 thin films were synthesized in relatively dense, highly homogenous, porous and highly effective specific surface areas of nanoparticles on substrates. The electrochemical studies exhibited that Mn doping lead to decrease of recombination rate of photogenerated electron-hole pairs which can be related to creation defects as electroactive and photoactive sites in electrodeposited film through doping process. Results also showed the presence ofMn could narrow the band gap of doped films which promotes photoactivity of TiO2 films in visible light range. EIS study results showed that the smallest resistance of charge transfer was belonging to TiO2: Mn (5%) thin film. Results of photodegradation analyses for degradation of RhB under sunlight irradiation displayed that the all Mn-doped TiO2 thin films showed more degradation efficiency than pure TiO2 and the photocatalytic performance of films was improved with increasing Mn concentration up 5% and best degradation efficiency was obtained for TiO2: Mn (5%) thin film (99% degradation efficiency under 120 minutes sunlight irradiation) due to hinder the recombination of photogenerated holes and electrons. Therefore, the appropriate amount of Mn in TiO2 thin film was obtained in TiO2: Mn (5%) thin film for electrochemical and photoelectrochemical performance.
机译:该研究进行了研究Mn掺杂TiO2薄膜的形态学,结构,电化学和光催化性质的掺杂剂的临床浓度效应。通过电沉积方法和XRD,SEM,电化学和电化学和纯TiO2和Mn掺杂TiO2薄膜。应用光降解分析用于合成薄膜的表征。 XRD结果表明,纯TiO 2和Mn掺杂的TiO 2薄膜在TiO 2的锐钛矿相中沉积,随着掺杂剂浓度的增加,TiO2纳米晶体尺寸略微降低。 SEM分析表明,纯TiO 2和Mn掺杂的TiO 2薄膜在基材上的纳米颗粒的纳米颗粒的相对致密,高度均匀,多孔且高效的比表面积中合成。电化学研究表明,Mn掺杂导致光生电子 - 空穴对重组率的降低,其通过掺杂工艺与电沉积膜中的电活性和光活性位点有关。结果还显示出存在的存在可能缩小掺杂薄膜的带隙,其在可见光范围内促进TiO 2膜的光度。 EIS研究结果表明,电荷转移的最小电阻属于TiO 2:Mn(5%)薄膜。阳光照射下RHB降解的光降解分析显示,所有Mn掺杂的TiO2薄膜显示出比纯TiO2更多的降解效率,并且随着Mn浓度的增加提高了薄膜的光催化性能,得到了最佳的降解效率TiO2:Mn(5%)薄膜(在120分钟下的阳光照射下的99%的降解效率)由于阻碍了光生孔和电子的重组。因此,在TiO 2:Mn(5%)薄膜中获得适量的TiO 2薄膜中的Mn,用于电化学和光电化学性能。

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