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Research Progress of Low Temperature Plasma Technology to Treat Sulfur-containing Malodorous Gas

机译:低温等离子体技术治疗含硫恶臭气体的研究进展

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This paper briefly discusses the source, harm and removal methods of sulfur-containing malodorous gas. At this stage, the main methods for treating sulphur-containing malodorous gases are physical, chemical and biological methods. In contrast, low temperature plasma technology combines the advantages of physical, chemical and biological methods, and can effectively overcome the disadvantages of traditional processes. Through the comparison of various methods, the advantages of low temperature plasma treatment of sulfur-containing malodorous gas are summarized, and the corresponding removal mechanism is proposed. The treatment progress and existing problems of using low-temperature plasma to remove sulfur-containing malodorous gas, especially hydrogen sulfide, carbon disulfide, methyl sulfide, methyl mercaptan and dimethyl disulfide, are comprehensively discussed. A new idea for the simultaneous removal of multi-component sulfur-containing malodorous gas by low temperature plasma is proposed. Compared with traditional methods, low temperature plasma technology has the advantages of simple process, strong applicability, easy operation, and low energy consumption in processing sulfur-containing malodorous gases. The treatment of sulfur-containing malodorous gas by low-temperature plasma technology needs further research.
机译:本文简要讨论了含硫恶臭气体的源,危害和去除方法。在此阶段,治疗含硫的恶臭气体的主要方法是物理,化学和生物学方法。相比之下,低温等离子体技术结合了物理,化学和生物学方法的优点,并且可以有效地克服传统过程的缺点。通过各种方法的比较,总结了含硫含硫的恶臭气体的低温等离子体处理的优点,提出了相应的去除机制。全面讨论了使用低温等离子体以除去含硫的恶臭气体,尤其是硫化氢,二硫化碳,甲基硫化物,甲硫醇和二甲基二硫醚的存在的治疗进展和存在的问题。提出了通过低温等离子体同时去除含多元硫的恶臭气体的新思路。与传统方法相比,低温等离子体技术具有简单的工艺优点,适用性强,操作简便,能耗低,加工含硫的恶臭气体。通过低温等离子体技术处理含硫的恶臭气体需要进一步研究。

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