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Deposition Mechanism and Thickness Control of CVD SiC Coatings on NextelTM440 Fibers

机译:NETTELTM440纤维CVD SIC涂层的沉积机理和厚度控制

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SiC coatings were successfully synthesized on NextelTM440 fibers by chemical vapor deposition (CVD) using methyltrichlorosilane as the original SiC source at 1373 K. After deposited, the fibers were fully surrounded by uniform coatings with some bulges. The X-ray diffraction (XRD), X-ray photoelectron spectroscopy (XPS) and high-resolution transmission electron microscopy (HR-TEM) results indicated that the coatings were composed of β-SiC and free carbon. Moreover, thickness control of the coatings could be carried out by adjusting the deposition time. The coating thickness rose exponentially, and the exterior of the coatings became looser as the deposition time increased. The thickness of about 1.5 μm was obtained after depositing for 4 h. The coating thickness was also theoretically calculated, and the result agreed well with the measured thickness. Finally, the related deposition mechanism is discussed and a deposition model is built.
机译:通过使用甲基三氯硅烷在1373K的原始SiC源作为原始SiC源的化学气相沉积(CVD)在NexteltM440纤维上成功地合成了SiC涂层。沉积后,纤维完全被带有一些凸起的均匀涂层包围。 X射线衍射(XRD),X射线光电子能谱(XPS)和高分辨率透射电子显微镜(HR-TEM)结果表明涂层由β-SiC和游离碳组成。此外,可以通过调节沉积时间来进行涂层的厚度控制。涂层厚度呈指数增长,并且随着沉积时间的增加,涂层的外部变得松动。沉积4小时后获得约1.5μm的厚度。理论上还计算涂层厚度,结果与测量的厚度很好。最后,讨论了相关的沉积机制,构建了沉积模型。

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