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首页> 外文期刊>Coatings >Microstructure and Rutherford Backscattering Spectrometry of Hard/Lubricant Mo-Ti-Al-N Multilayered Coatings Prepared by Multi-Arc Ion Plating at Low Substrate Rotation
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Microstructure and Rutherford Backscattering Spectrometry of Hard/Lubricant Mo-Ti-Al-N Multilayered Coatings Prepared by Multi-Arc Ion Plating at Low Substrate Rotation

机译:通过在低基板旋转下通过多电弧离子镀层制备的硬/润滑剂MO-TI-AL-N多层涂层的微观结构和Rutherford光谱法

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To develop the hard and self-lubricating coatings applied for the industrial dry-cutting and die-casting machining tool fields, a series of MoTiAlN/MoN/Mo multilayered coatings were deposited on Si substrates under low substrate rotation by cathodic multi-arc ion plating. XRD, SEM, TEM, RBS, nanoindentation, and tribology tester were used to monitor the phase structure, morphology, component, nanohardness, and friction coefficient of the coatings. It was found that the coatings deposited at various substrate rotations comprised paramount cubic B1 structure TiAlN and Mo2N phases. The micrographs confirmed that the mean modulation period and total physical thickness of multilayered TiAlN/Mo2N coatings with a sharp interface fabricated at 2 revolutions per minute (rpm) were 26 nm and 1.15 μm. The mean nanohardness and friction coefficient were ca. 30 GPa and 0.4, respectively. RBS results along with the SIMNRA code allowed to estimate the total atomic concentrations and the physical thickness of individual sublayer as well as the modulation period of multilayered coatings, which demonstrated an efficiency of this approach for characterization of nano-multilayered structures.
机译:为了开发应用于工业干切割和压铸加工工具领域的硬质和自润滑涂层,通过阴极多电弧离子电镀的低基板旋转在Si基板上沉积了一系列动机N / MON / MO多层涂层。使用XRD,SEM,TEM,RB,纳米凸缘和摩擦学测试仪来监测涂层的相结构,形态,组分,纳米型和摩擦系数。发现沉积在各种基板旋转处的涂层包括焦点立方B1结构TiAlN和Mo2N阶段。显微照片证实,多层TiAlN / Mo2N涂层的平均调节周期和总物理厚度,其具有在每分钟2转(RPM)的2转(RPM)的尖锐界面为26nm和1.15μm。平均纳米和摩擦系数是Ca. 30 GPA和0.4分别。 RBS结果以及允许的SIMNRA代码估计全原子浓度和多层涂层的调制周期,这证明了这种方法的效率,用于表征纳米多层结构。

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