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X-ray Diffraction Investigation of Stainless Steel—Nitrogen Thin Films Deposited Using Reactive Sputter Deposition

机译:使用反应溅射沉积沉积不锈钢 - 氮薄膜的X射线衍射研究

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An X-ray diffraction investigation was carried out on nitrogen-containing 304 stainless steel thin films deposited by reactive rf magnetron sputtering over a range of substrate temperature and bias levels. The resulting films contained between ~28 and 32 at.% nitrogen. X-ray analysis was carried out using both the standard Bragg-Brentano method as well as area-detector diffractometry analysis. The extent of the diffraction anomaly ((002) peak shift) was determined using a calculated parameter, denoted RB, which is based on the (111) and (002) peak positions. The normal value for RB for FCC-based structures is 0.75 but increases as the (002) peak is anomalously displaced closer to the (111) peak. In this study, the RB values for the deposited films were found to increase with substrate bias but decrease with substrate temperature (but still always 0.75). Using area detector diffractometry, we were able to measure d111/d002 values for similarly oriented grains within the films, and using these values calculate c/a ratios based on a tetragonal-structure model. These results allowed prediction of the (002)/(200) peak split for tetragonal structures. Despite predicting a reasonably accessible split (~0.6°–2.9°–2θ), no peak splitting observed, negating the tetragonal-structure hypothesis. Based on the effects of film bias/temperature on RB values, a defect-based hypothesis is more viable as an explanation for the diffraction anomaly.
机译:在含氮的304不锈钢薄膜上进行X射线衍射研究,通过反应性RF磁控管溅射在一定范围的基板温度和偏置水平上沉积。所得薄膜含有〜28和32之间。%氮。使用标准布拉格 - 布伦塔诺方法以及区域检测器衍射测定分析进行X射线分析。使用计算的参数确定衍射异常((002)峰值移位的程度,表示为RB,其基于(111)和(002)峰位置。用于FCC基结构的RB的正常值为0.75,但随着(002)峰值越近于(111)峰值而增加。在该研究中,发现沉积膜的RB值随衬底偏置而增加,但随着衬底温度(但仍然总是> 0.75)增加。使用区域检测器衍射测定法,我们能够测量薄膜内类似面向晶粒的D111 / D002值,并使用这些值基于四字体结构模型计算C / A比率。这些结果允许预测(002)/(200)峰值分割用于四方结构。尽管预测了合理的分裂(〜0.6°-2.9°-2θ),但没有观察到峰值分裂,否定四方结构假设。基于薄膜偏置/温度对RB值的影响,基于缺陷的假设是对衍射异常的解释更加可行。

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