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Electrochemical Properties and Chemical Oxygen Demand Depending on the Thickness of Boron-Doped Diamond

机译:电化学性能和化学氧需求取决于硼掺杂金刚石的厚度

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In this study, boron-doped diamond (BDD) film was deposited by hot-filament chemical vapor deposition (HFCVD) using acetone as the carbon source and trimethyl borate (TMB) as the boron source with the aim of lowering the manufacturing cost of BDD electrodes. The BDD film was deposited for 12 and 60 h to observe changes in the morphological behavior of the film as well as subsequent changes in the electrochemical properties. The morphology of the BDD film was not affected by the deposition time, but the thickness increased with increasing deposition time. As the deposition time increased, the deposition rate of the BDD film did not increase or decrease; rather, it remained constant at 100 nm/h. As the thickness of the BDD film increased, an increase in the potential window was observed. On the other hand, no distinct change was observed in the electrochemical activation and catalytic activity depending on the thickness, and there were not many differences. Chemical oxygen demand (COD) was measured to determine the practical applicability of the deposited BDD film. Unlike the potential window, the COD removal rate was almost the same and was not affected by the increase in the thickness of the BDD film. Both films under the two deposition conditions showed a high removal rate of 90% on average. This study confirms that BDD electrodes are much more useful for water treatment than the existing electrodes.
机译:在该研究中,通过使用丙酮作为碳源和三甲基硼酸盐(TMB)作为硼源的热丝化学气相沉积(HFCVD)沉积硼掺杂的金刚石(HFCVD),目的是降低BDD的制造成本电极。将BDD薄膜沉积12和60小时,观察膜的形态行为的变化以及电化学性质的后续变化。 BDD薄膜的形态不受沉积时间的影响,但厚度随着沉积时间的增加而增加。随着沉积时间增加,BDD膜的沉积速率不会增加或减少;相反,它保持恒定在100 nm / h。随着BDD膜的厚度增加,观察到潜在窗口的增加。另一方面,根据厚度在电化学活化和催化活性中没有观察到不同的变化,并且没有许多差异。测量化学需氧量(COD)以确定沉积的BDD膜的实际适用性。与潜在窗口不同,COD去除速率几乎相同并且不受BDD膜厚度的增加的影响。两种沉积条件下的两种薄膜显示平均较高的去除率为90%。该研究证实,BDD电极对水处理比现有电极更有用。

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