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Effect of thickness on characteristics of ZnSe thin film synthesized by vacuum thermal evaporation

机译:厚度对真空热蒸发合成ZnSe薄膜特性的影响

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Zinc selenide (ZnSe) thin films with various thicknesses were grown on ultrasonically clean glass substrates using vacuum evaporation of 99.99% pure ZnSe powder. Thickness dependence of the structural, optical and electrical properties was thoroughly investigated. X-ray diffraction (XRD) analyses revealed that (110) ZnSe plane is the dominant crystal plane for all the fabricated films. Both dislocation density and micro-strain go down with the increase in film thickness, indicating lower lattice defects and improvement in crystallinity at higher film thickness. Transmittance spectra show that all the films have almost linear upward tendency of transmittance in near-infrared region and small fluctuations in visible region for higher-thickness films. With the increase in film thickness, the optical bandgap increases and also an increasing tendency of dielectric constant was observed. Studies of electrical properties showed a sharp increase in carrier mobility and concentration with film thickness. As the film thickness increases from 30 to 90?nm, the carrier mobility goes up from 255 to 1250?cm~(2)/VS and the carrier concentration increases from 2.14?×?10~(18)to 9.37?×?10~(18)?cm~(?3). The electrical transport properties of the deposited thin films were explained in terms of scattering of the charge carrier.
机译:使用99.99%纯锌粉的真空蒸发在超声蒸发上生长具有各种厚度的硒化锌(ZnSe)薄膜。彻底研究了结构,光学和电性能的厚度依赖性。 X射线衍射(XRD)分析显示(110)ZnSe平面是用于所有制造薄膜的主要晶体平面。脱位密度和微应变均随着薄膜厚度的增加而下降,表明较低的晶格缺陷和更高膜厚度的结晶度的改善。透射谱表明,所有薄膜在近红外区域中的透射率几乎是线性向上趋势,并且在可见区域中的较小波动的透射率为更高厚度的膜。随着膜厚度的增加,光学带隙的增加,观察到介电常数的增加趋势。电性能的研究表明,载体迁移率和薄膜厚度的浓度急剧增加。随着膜厚度从30〜90Δnm增加,载流子迁移率从255到1250?cm〜(2)/ vs,并且载流子浓度从2.14?×10〜(18)到9.37?×10 〜(18)?cm〜(?3)。在散射载体的散射方面解释了沉积的薄膜的电气传输性质。

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