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Highly Crystalline CVD-grown Multilayer MoSe2 Thin Film Transistor for Fast Photodetector

机译:高度结晶CVD-种植多层气体系统 2 快速光电探测器的薄膜晶体管

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Hexagonal molybdenum diselenide (MoSe2) multilayers were grown by chemical vapor deposition (CVD). A relatively high pressure (>760?Torr) was used during the CVD growth to achieve multilayers by creating multiple nuclei based on the two-dimensional crystal growth model. Our CVD-grown multilayer MoSe2 thin-film transistors (TFTs) show p-type-dominant ambipolar behaviors, which are attributed to the formation of Se vacancies generated at the decomposition temperature (650?°C) after the CVD growth for 10?min. Our MoSe2 TFT with a reasonably high field-effect mobility (10?cm2/V?·?s) exhibits a high photoresponsivity (93.7?A/W) and a fast photoresponse time (τrise?~?0.4?s) under the illumination of light, which demonstrates the practical feasibility of multilayer MoSe2 TFTs for photodetector applications.
机译:通过化学气相沉积(CVD)生长六边形钼酶(MOSE 2 )多层。在CVD生长期间使用相对高的压力(>760≤Torr),通过基于二维晶体生长模型创造多个核来实现多层。我们的CVD-种多层MOSE 2 薄膜晶体管(TFT)显示了p型主导的非胆量行为,其归因于在分解温度(650Ω°C)处产生的SE空位的形成CVD生长10?分钟后。我们的MOSE 2 TFT,具有合理的高场效应迁移率(10?cm 2 / v?··s)表现出高光响应性(93.7?a / w)和在光照的照明下,快速光响应时间(τ上升〜?0.4秒),其展示了用于光电探测器应用的多层MOSE 2 TFT的实际可行性。

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