An application of Mueller matrix polarimetry for characterising properties of thin film with surface roughness

摘要

A new Mueller ellipsometry method was proposed for characterising the optical properties of thin films with rough surfaces. The validity of the proposed study is demonstrated by comparing the experimental results of the refractive index and thickness of thin film with the analytical results. Furthermore, the proposed study extracted successfully the surface roughness of thin film samples in a non contact optical manner. It provides a potential solution to replace the well-known effective approximate medium (EMA) method in dealing with the fine coarserough surface thin film