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首页> 外文期刊>Bulletin of the Korean Chemical Society >Passive Film on Cobalt: A Three-Parameter Ellipsometry Study During the Film Formation
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Passive Film on Cobalt: A Three-Parameter Ellipsometry Study During the Film Formation

机译:钴上的钝化膜:成膜过程中的三参数椭圆仪研究

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Thin film being formed on the surface of cobalt in the early stage of electrochemically induced passivation was studied by the three-parameter ellipsometry. The growth of the passive film was complete in a few seconds from the onset of the passivating potential, and was followed by a slight decrease in the thickness in 4-40 seconds. The optical constants of the passive film changed gradually during the changes in the thickness. The thickness and the optical properties at the steady state of passivation depended on the potential of the electrode. From the coulometric data and the optical properties, the composition of the passive films was deduced to be close to those of CoO, Co3O4, and Co2O3 depending on the potential. Cathodic reduction in the presence of EDTA was found to be an efficient way to obtain film-free reference surface of cobalt.
机译:通过三参数椭圆仪研究了电化学诱导钝化初期在钴表面形成的薄膜。从钝化电位开始,几秒钟内钝化膜的生长就完成了,然后在4-40秒内厚度略有减小。钝化膜的光学常数在厚度变化期间逐渐变化。钝化稳定状态下的厚度和光学特性取决于电极的电势。从库仑数据和光学性质,根据电位推定,钝化膜的成分接近于CoO,Co3O4和Co2O3的成分。发现在EDTA存在下进行阴极还原是获得无膜钴参考表面的有效方法。

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