Deposition of nanosilver-organosilicon composite films using an atmospheric pressure DC plasma jet

摘要

Silver nanoparticles embraced hybrid thin films were deposited by anatmospheric pressure direct current plasma jet system using tetramethyldisiloxane asorganosilicon precursor. Nanoparticles were directly introduced into the process. Thecharacterization of the hybrid films was investigated using XPS and radio frequencyglow discharge optical emission spectroscopy (RF-GD-OES). It was found thatcomposite films with Ag-NPs can be deposited by our method with the silver content inthe film up to 50%.