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Optical and electrical properties of ZnSe thin films: effect of vacuum annealing

机译:ZnSe薄膜的光电性能:真空退火的影响

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Inert gas condensation method has been successfully employed for depositingZnSe thin films. These films have been deposited at argon gas partial pressure of 210-1mbar and room temperature (298 K). After deposition these films have been annealed(in vacuum at 473 K) for one hour. The optical and electrical properties of these filmshave been investigated before and after annealing using optical transmission andconductivity measurements. The absorption coefficient () and band gap (Eg) arecalculated using transmission curves. Optical transmittance measurements indicate theexistence of direct allowed optical transition with a corresponding energy gap in therange of 2.80".00 eV. The dark conductivity (d) and photoconductivity (ph)measurements, in the temperature range 253"58 K, indicate that the conduction inthese materials is through an activated process having two activation energies. d andph values increase with the annealing. The values of carrier life time have beencalculated and these values increase with the increase in the crystallite size onannealing. Thermal treatment has appreciable effect on above mentioned properties.
机译:惰性气体冷凝法已经成功地用于沉积ZnSe薄膜。这些薄膜是在210-1mbar的氩气分压和室温(298 K)下沉积的。沉积之后,将这些膜退火(在473 K的真空中)一小时。这些薄膜的光学和电学性质已经在退火前后使用光透射和电导率测量进行了研究。使用透射曲线计算吸收系数()和带隙(Eg)。透光率测量表明存在直接允许的光跃迁,其相应的能隙在2.80“ .00 eV范围内。在253” 58 K的温度范围内的暗电导率(d)和光电导率(ph)测量表明这些材料是通过具有两个活化能的活化过程形成的。 d和ph值随退火而增加。已经计算出载流子寿命的值,并且这些值随着退火时晶粒尺寸的增加而增加。热处理对上述性能有明显的影响。

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