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XRD, SEM and Low temperature electrical transport in a metallic multilayer

机译:X射线衍射,扫描电镜和低温电传输在金属多层中

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Amultilayer, [Ni(100nm)/Fe(100nm)]3has been investigated for the structure and low temperature resistivity. The resistivity increased with increase in temperature. The residual resistivity ratio (RRR) and the temperature coefficient of resistivity (TCR) were determined. The power law variations of resistivity with temperature were established. The contributions to resistivity for T above 80K are attributed to be predominant by electron-phonon and electron-magnon scatterings and for below 30K they are ascribed to be predominant by electron-electron and electron-defect scattering.
机译:研究了多层[Ni(100nm)/ Fe(100nm)] 3的结构和低温电阻率。电阻率随着温度的升高而增加。确定残留电阻率比(RRR)和电阻率温度系数(TCR)。建立了电阻率随温度的幂律变化。对于80 K以上的T,电阻率的贡献主要是由电子-声子和电子-马农散射引起的,而对于低于30K的T,则归因于电子-电子和电子缺陷的散射。

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