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Optoelectronic and Electrochemical Properties of Vanadium Pentoxide Nanowires Synthesized by Vapor-Solid Process

机译:汽固法合成五氧化二钒纳米线的光电和电化学性质

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Substantial synthetic vanadium pentoxide (V 2 O 5 ) nanowires were successfully produced by a vapor-solid (VS) method of thermal evaporation without using precursors as nucleation sites for single crystalline V 2 O 5 nanowires with a (110) growth plane. The micromorphology and microstructure of V 2 O 5 nanowires were analyzed by scanning electron microscope (SEM), energy-dispersive X-ray spectroscope (EDS), transmission electron microscope (TEM) and X-ray diffraction (XRD). The spiral growth mechanism of V 2 O 5 nanowires in the VS process is proved by a TEM image. The photo-luminescence (PL) spectrum of V 2 O 5 nanowires shows intrinsic (410 nm and 560 nm) and defect-related (710 nm) emissions, which are ascribable to the bound of inter-band transitions (V 3d conduction band to O 2p valence band). The electrical resistivity could be evaluated as 64.62 Ω·cm via four-point probe method. The potential differences between oxidation peak and reduction peak are 0.861 V and 0.470 V for the first and 10th cycle, respectively.
机译:无需使用前驱物作为具有(110)生长面的单晶V 2 O 5纳米线的成核位点,就可以通过热固汽相(VS)方法成功地生产出大量的合成五氧化二钒(V 2 O 5)纳米线。通过扫描电子显微镜(SEM),能量色散X射线光谱仪(EDS),透射电子显微镜(TEM)和X射线衍射(XRD)分析了V 2 O 5纳米线的微观形貌和微观结构。通过TEM图像证明了VS过程中V 2 O 5纳米线的螺旋生长机理。 V 2 O 5纳米线的光致发光(PL)光谱显示出固有的(410 nm和560 nm)发射和与缺陷相关的(710 nm)发射,这归因于带间跃迁的边界(V 3d导带O 2p价带)。通过四点探针法可以将电阻率评估为64.62Ω·cm。对于第一循环和第十循环,氧化峰和还原峰之间的电势差分别为0.861 V和0.470V。

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