Application of AACVD for the deposition of copper sulfide nanostructured thin film from newly synthesized copper complex

摘要

The copper(II) complex of N -[ethyl(butyl)carbamothioyl]-3,5-dinitrobenzamide ( 1 ) has been synthesized and characterized by elemental analysis, I.R spectroscopy and atmospheric pressure chemical ionization-mass spectrometry (MS-APCI). Thermogravimetric analysis shows the complex ( 2 ) decomposes in two-step to form copper sulfide. The complex was used as single-source precursor for the deposition of copper sulfide thin film by aerosol assisted chemical vapour deposition (AA-CVD) at 350 o C. Powder X-ray diffraction (p-XRD) pattern of thin film of complex showed the deposition of monoclinic roxbyite Cu 7 S 4 and orthorhombic anilite Cu 7 S 4 phases at 350 o C with spherical crystallites. The degree of film surface roughness was determined by atomic force microscopy (AFM). The scanning electron microscopy (SEM) and energy dispersive X-ray analysis (EDX) results showed the uniform distribution of copper sulfide in the film, which makes it useful semiconducting material on a structured surface.