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Effects of Cu Addition on Hydrogen Absorption and Diffusion Properties of 1470 MPa Grade Thin-walled Steel in a Solution of HCl

机译:铜对盐酸溶液中1470 MPa级薄壁钢氢吸收和扩散性能的影响

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Hydrogen embrittlement is caused by the introduction of hydrogen into steel and is critical for high strength steels. To clarify the effects of the addition of Cu on the suppression of hydrogen embrittlement in a solution of HCl, hydrogen permeation tests and dynamic polarization measurements were conducted on TS 1470 MPa grade, low-carbon martensite steels. To this end, steels containing 0.19% C, 0.2% Si, 1.3% Mn, Cr, Ti, Nb and B were prepared with and without 0.16% Cu. For comparison, ferrite and pearlite steels were also examined. The results of hydrogen permeation tests indicated that the steady-state hydrogen permeation current (J _(H)) of steel containing 0.16% Cu was considerably lower than that of basic steel in 0.1 N HCl at the corrosion potential. Moreover, the J _(H) of martensite steel was suppressed by the addition of Cu, and the cathode current, (i _(C)) and the J _(H)/i _(C) were reduced. The results obtained in this study corroborated the hypothesis that the 1 or 2-μm metallic Cu particles precipitated on the surface of the steel in a solution of HCl suppressed the cathodic reaction and the introduction of hydrogen. The hydrogen diffusion constant (D _(eff)) was obtained from hydrogen permeation tests under a potential gradient. Cu addition has only small effect on D _(eff) regardless of microstructure. The occupancy of trap site (n _(X)) was estimated to be greater than 99% independent of Cu content and microstructure.
机译:氢脆是由氢引入钢引起的,这对于高强度钢至关重要。为了阐明添加铜对抑制HCl溶液中氢脆的影响,对TS 1470 MPa级低碳马氏体钢进行了氢渗透测试和动态极化测量。为此,在有和没有0.16%的Cu的情况下制备了含有0.19%的C,0.2%的Si,1.3%的Mn,Cr,Ti,Nb和B的钢。为了进行比较,还检查了铁素体和珠光体钢。氢渗透测试的结果表明,在腐蚀电位下,含0.16%Cu的钢的稳态氢渗透电流(i J_(H))远低于碱性钢在0.1 N HCl中的稳态氢渗透电流。另外,通过添加Cu来抑制马氏体钢的J _(H),并且阴极电流(i _(C))和J _(H)/ i _(C)减小。在这项研究中获得的结果证实了以下假设:在HCl溶液中析出的1或2-μm金属Cu颗粒抑制了阴极反应和氢的引入。氢扩散常数(i D _(eff))是在电势梯度下从氢渗透试验获得的。铜的添加对D_(eff)的影响很小,无论其微观结构如何。与铜含量和微结构无关,估计陷阱位点的占有率(i n_(X))大于99%。

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