NiMnGa thin films were dc magnetron sputter deposited onto well cleaned substrates of Si(100) and glass in high pure argon environment of vacuum 0.01 mbar at low sputtering power of 36W and their mechanical properties were investigated by nanoindentation technique using calibrated Berkovich indenter. Results reveal that the films posses elasto-plastic nature. The elastic modulus of the films was found to be thickness as well as substrate dependent, whereas, the indentation hardness of the films was found to be thickness dependent but substrate independent. The highest elastic modulus of the films obtained was 151.02 GPa and highest indentation hardness of the films was found to be 5513.3 MPa.
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