Nickel Thin Film Resonantly Generated at a Rate of Megahertz

摘要

Resonant frequencies at which masses of Ni thin films deposited from a nickel sulfamate solutionsignificantly increase are observed using a rectangular pulse current technique having a frequency ofthe megahertz scale. The resonant frequency spacing between the neighboring resonant frequencieskeeps a constant value of 0.2 MHz. The presence of many resonant frequencies and the constantresonant frequency spacing show an energy level transition between an electron at the Fermi energylevel in an electrode and a nickel sulfamate ion characterized by a quantized rotational energy level. Inaddition, at a frequency beyond the highest resonant frequency the normalized deposition mass thatkeeps a constant value nearly equal to 1 is found. The frequency named as a non-capacitativefrequency shifts to a lower frequency with an increase in the solution temperature. This indicates thatthe electric double layer in the solution loses a capacitative property owing to nickel sulfamate ionsthat do not rotate at the applied pulse frequency.