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首页> 外文期刊>International Journal of Electrochemical Science >Comparison Between Electropolishing Behavior of Copper and Mild Steel in the Presence of Lactic and Mandolic Acid
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Comparison Between Electropolishing Behavior of Copper and Mild Steel in the Presence of Lactic and Mandolic Acid

机译:乳酸和扁桃酸存在下铜和低碳钢的电抛光行为比较

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Addition of lactic and mandolic acid to electropolishing bath of copper and steel was examined usingpotentiodynamic polarization, weight loss method and scanning electron microscopic studies.Addition of different concentrations of lactic and mandolic acid gave a clear reduction inelectropolishing rate. Scanning electron microscopic studies supplied the assenting proof of get bettersurface condition after addition of lactic and mandolic to electropolishing bath. The kinetic andactivated parameters were computed for the dissolution process. Addition of lactic and mandolic acidto electropolishing bath made the solution appeared hopeful, a diverse development in the finish wasnoted where surface roughness ,Ra decreases to a great extent by addition of lactic and mandolic acid.
机译:通过电位动力学极化,失重法和扫描电镜研究了铜和铜的电抛光液中乳酸和扁桃酸的加入。不同浓度的乳酸和扁桃酸的加入明显降低了电抛光速率。扫描电子显微镜研究提供了在电抛光浴中添加乳酸和扁桃酸后获得更好表面状况的佐证。计算溶解过程的动力学和活化参数。在电抛光浴中加入乳酸和扁桃酸使溶液看起来很有希望,注意到在精加工中的多样化发展,通过加入乳酸和扁桃酸,表面粗糙度Ra大大降低。

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