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Study the Effect of Irradiation Time and HF Concentration on Porosity of Porous Silicon and Study Some of the Electrical Properties of Its Based Device

机译:研究辐照时间和HF浓度对多孔硅孔隙率的影响,并研究其基器件的一些电性能

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Porous silicon has been produced in this work by photochemical etching process (PC).The irradiation has been achieved using ordinary light source (150δ250 W) power and (875 nm) wavelength. The influence of various irradiation times and HF concentration on porosity of PSi material was investigated by depending on gravimetric measurements. The I-V and C-V characteristics for CdS/PSi structure have been investigated in this work too.
机译:在这项工作中,通过光化学蚀刻工艺(PC)生产了多孔硅。使用普通光源(150δ250W)功率和(875 nm)波长实现了辐照。依靠重量测量研究了各种辐照时间和HF浓度对PSi材料孔隙率的影响。在这项工作中,还研究了CdS / PSi结构的I-V和C-V特性。

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