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Strain and Dimension Effects on the Threshold Voltage of Nanoscale Fully Depleted Strained-SOI TFETs

机译:应变和尺寸对纳米级全耗尽应变SOI TFET阈值电压的影响

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A novel nanoscale fully depleted strained-SOI TFET (FD-SSOI TFET) is proposed and exhaustively simulated through Atlas Device Simulator. It is found that FD-SSOI TFET has the potential of improved on-current and steep subthreshold swing. Furthermore, the effect of strain and dimension on the threshold voltage of FD-SSOI TFET is thoroughly studied by developing a model based on its physical definition. The validity of the model is tested for FD-SSOI TFET by comparison to 2D device simulations. It is shown that the proposed model can predict the trends of threshold voltage very well. This proposed model provides valuable reference to the FD-SSOI TFETs design, simulation, and fabrication.
机译:提出了一种新型的纳米级全耗尽应变SOI TFET(FD-SSOI TFET),并通过Atlas Device Simulator进行了详尽的仿真。发现FD-SSOI TFET具有改善导通电流和陡峭的亚阈值摆幅的潜力。此外,通过基于其物理定义建立模型,彻底研究了应变和尺寸对FD-SSOI TFET阈值电压的影响。通过与2D器件仿真进行比较,测试了该模型对于FD-SSOI TFET的有效性。结果表明,该模型可以很好地预测阈值电压的变化趋势。该模型为FD-SSOI TFET的设计,仿真和制造提供了有价值的参考。

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