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Electrochemical Deposition of Ni–W Crack-Free Coatings

机译:Ni-W无裂纹涂层的电化学沉积

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The main features of electrochemical deposition of coatings based on Ni–W binary alloy in the pulse current mode using pyrophosphate electrolytes were studied. Two electrolytes with a pH of 8.7 and 9.5 were used. The deposition was carried out with the current density varying in the range of 0.01–0.1 A·cm?2, and the duty cycle (the relative pulse duration) was changed within the range 20–100%. The surface morphology and elemental and phase composition of the coatings were studied by scanning electron microscopy, energy-dispersive X-ray microanalysis and X-ray diffractometry. The experimental conditions allowing us to achieve the maximum Faradaic efficiency and W content in the coatings were determined. It was found that the pulse current mode enabled the fabrication of crack-free coatings with a thickness greater than 6 μm.
机译:研究了使用焦磷酸盐电解质在脉冲电流模式下基于Ni-W二元合金的涂层的电化学沉积方法的主要特征。使用两种pH值为8.7和9.5的电解质。沉积是在电流密度范围为0.01–0.1 A·cm?2的范围内进行的,并且占空比(相对脉冲持续时间)在20%至100%的范围内变化。通过扫描电子显微镜,能量色散X射线显微分析和X射线衍射法研究了涂层的表面形态,元素和相组成。确定了使我们达到最大法拉第效率和涂层中W含量的实验条件。发现脉冲电流模式能够制造厚度大于6μm的无裂纹涂层。

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