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Adhesion Performance of Electrodeposited Ni Films with Different Treating Methods

机译:不同处理方法对电沉积镍膜的附着性能

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The adhesion strength between thin films has a significant effect on performance of micro-devices. It is introduced that the effects of three pre-treatment methods: acid, pulse reverse current and anodic current, on the adhesion performance of electrodeposited Ni films on Ni substrate. The adhesion strength, surface and fracture morphology of the Ni films were investigated. The dense oxide films on the Ni substrate were removed effectively by using the anodic dissolution current method in the acidic chloride solutions. Meanwhile, the Ni films treated with specific treatment conditions produced different roughness, which was responsible for the improved adhesion strength. The adhesion strength of the Ni films increased up to 629.8 MPa when substrates were treated with anodic current density of 30 mA/cm2 for 10 min, which is nearly two times higher than that of films treated by 5 vol % HCl for 10 min. The results indicate that the anodic current treatment method effectively improves the adhesion strength of Ni films.
机译:薄膜之间的粘合强度对微器件的性能有重要影响。介绍了酸,脉冲反向电流和阳极电流三种预处理方法对电沉积Ni膜在Ni基体上的附着性能的影响。研究了镍膜的粘附强度,表面和断裂形态。通过在酸性氯化物溶液中使用阳极溶解电流法,可以有效地去除Ni基体上的致密氧化膜。同时,在特定的处理条件下处理的Ni膜产生不同的粗糙度,这有助于提高粘合强度。当用30 mA / cm2的阳极电流密度处理衬底10分钟时,Ni膜的粘附强度增加到629.8 MPa,几乎是用5vol%HCl处理10min的膜的两倍。结果表明,阳极电流处理方法有效提高了镍膜的附着强度。

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