...
首页> 外文期刊>IEEE Transactions on Components and Packaging Technologies >Effect of Local Hot Spots on the Maximum Dissipation Rates During Flow Boiling in a Microchannel
【24h】

Effect of Local Hot Spots on the Maximum Dissipation Rates During Flow Boiling in a Microchannel

机译:微通道内沸腾过程中局部热点对最大耗散率的影响

获取原文
获取原文并翻译 | 示例
           

摘要

One of the most promising technologies to replace air-cooling of micro-processor chips is flow boiling in microchannels. The very high heat flux dissipation from micro-processor chips is highly non-uniform due to the presence of multiple localized hot spots usually related to the localization of bridges and gate oxide shorts. Previous studies focused on the performance of microchannels under uniform heating conditions. Recently, Revellin and Thome have proposed a new theoretical model to predict the critical heat flux (CHF) in microchannels. This model has been modified here to take into account a non-uniform axial heat flux along a microchannel. The model is used here to perform a local hot spot study to investigate the effects of fluid, saturation temperature, mass flux, microchannel diameter, heated length, size, location and number of hot spots as well as the distance between two consecutive hot spots. Based on the present simulations, to best dissipate a hot spot''s heat flux, microchannel heat sinks should follow the following recommendations for a channel of fixed length: determine the optimum channel diameter for the fluid (typically either very small or large is best), utilize as high of mass flux as feasible, and design with as low of saturation temperature as possible. Furthermore, the local hot spot size should be as small as possible, the number of local hot spots as few as possible and the distance between two hot spots as large as possible. Utilizing the present numerical method for individual microchannels arranged in parallel in a multi-microchannel cooling element, it is possible to simulate the entire power dissipation profile of a microprocessor die for local limits of CHF.
机译:替代微处理器芯片空冷的最有前途的技术之一是微通道中的流动沸腾。由于存在多个通常与电桥和栅极氧化物短路的定位有关的局部热点,因此微处理器芯片产生的非常高的热通量非常不均匀。先前的研究集中在均匀加热条件下的微通道性能。最近,Revellin和Thome提出了一种新的理论模型来预测微通道中的临界热通量(CHF)。此模型已在此处进行了修改,以考虑到沿微通道的轴向热通量不均匀。这里使用该模型进行局部热点研究,以研究流体,饱和温度,质量通量,微通道直径,加热长度,大小,热点的位置和数量以及两个连续热点之间的距离的影响。根据当前的模拟,为最大程度地散发热点的热通量,微通道散热器应遵循以下有关固定长度通道的建议:确定流体的最佳通道直径(通常最好是很小或很大) ),尽可能利用尽可能高的质量通量,并以尽可能低的饱和温度进行设计。此外,局部热点的尺寸应尽可能小,局部热点的数量应尽可能少,并且两个热点之间的距离应尽可能大。利用本发明的数值方法对在多微通道冷却元件中平行布置的各个微通道进行计算,可以针对CHF的局部极限来模拟微处理器芯片的整个功耗分布。

著录项

相似文献

  • 外文文献
  • 中文文献
  • 专利
获取原文

客服邮箱:kefu@zhangqiaokeyan.com

京公网安备:11010802029741号 ICP备案号:京ICP备15016152号-6 六维联合信息科技 (北京) 有限公司©版权所有
  • 客服微信

  • 服务号