Analysis of Failure Mechanism in Anisotropic Conductive and Non-Conductive Film Interconnections

摘要

Failure behaviors of anisotropic conductive film (ACF) and non-conductive film (NCF) interconnects were investigated by measuring the connection resistance. The four-point probe method was used to measure the connection resistance of the adhesive joints constructed with Au bump on Si chip and Cu pad on flexible printed circuit. The interconnection reliability was evaluated by multiple reflow process. The connection resistance of the ACF joints was markedly higher than that of NCF joints, mainly due to the constriction of the current flow and the intrinsic resistance of the conductive particles in ACF joints. The connection resistances of both interconnections decreased with increasing bonding force, and subsequently converged to about 10 and 1 ${hbox{m}}Omega$ at a bonding force of 70 and 80 N, for the ACF and NCF joints, respectively. During the reflow process, two different conduction behaviors were observed: increased connection resistance and the termination of Ohmic behavior. The former was due to the decreased contact area caused by $z$-directional swelling of the adhesives, whereas the latter was caused by either contact opening in the adhesive joints or interface cracking.