首页> 外文期刊>Circuits and systems >The Design of Ultra-Low Power Adder Cell in 90 and 180 nm CMOS Technology
【24h】

The Design of Ultra-Low Power Adder Cell in 90 and 180 nm CMOS Technology

机译:90和180 nm CMOS技术的超低功耗加法器单元设计

获取原文
获取原文并翻译 | 示例
           

摘要

In this paper, an ultra-low power adder cell is proposed. With cascading two XNOR cells, the sum of two inputs is achieved. Regarding to advantages of m-GDI XNOR cell, we constructed the adder cell based on this architecture. The simulation results show that the power consumption of the adder cell designed with GDI technology is 12.993 μw, whereas for this cell designed with m-GDI technology is 4.1628 uw, which both are designed at 0.18 μm technology. Moreover, simulation results in 90 nm CMOS technology for m-GDI adder cell show average power consumption of 0.90262 μw and 6.3222 μw in 200 MHz and 2GHz, respectively.
机译:本文提出了一种超低功耗加法器电池。通过级联两个XNOR单元,可以实现两个输入的总和。关于m-GDI XNOR单元的优势,我们基于此架构构造了加法器单元。仿真结果表明,采用GDI技术设计的加法器单元的功耗为12.993μw,而采用m-GDI技术设计的该单元的功耗为4.1628 uw,两者均采用0.18μm技术设计。此外,针对m-GDI加法器单元的90 nm CMOS技术的仿真结果显示,在200 MHz和2 GHz频率下,平均功耗分别为0.90262μw和6.3222μw。

著录项

  • 来源
    《Circuits and systems》 |2016年第2期|58-67|共10页
  • 作者单位

    Laser and Optics Research School, Nuclear Science and Technology Research School, Atomic Energy Organization of Iran, Tehran, Iran;

    Laser and Optics Research School, Nuclear Science and Technology Research School, Atomic Energy Organization of Iran, Tehran, Iran,Department of Electrical Engineering, Ferdowsi University of Mashhad, Mashhad, Iran;

    Laser and Optics Research School, Nuclear Science and Technology Research School, Atomic Energy Organization of Iran, Tehran, Iran;

  • 收录信息
  • 原文格式 PDF
  • 正文语种 eng
  • 中图分类
  • 关键词

    Adder Cell; Gate-Diffusion-Input (GDI); Bit-Serial Adder;

    机译:加法器单元;门扩散输入(GDI);位串行加法器;

相似文献

  • 外文文献
  • 中文文献
  • 专利
获取原文

客服邮箱:kefu@zhangqiaokeyan.com

京公网安备:11010802029741号 ICP备案号:京ICP备15016152号-6 六维联合信息科技 (北京) 有限公司©版权所有
  • 客服微信

  • 服务号