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首页> 外文期刊>Applied Surface Science >Wideband anti-reflective silicon surface structures fabricated by femtosecond laser texturing
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Wideband anti-reflective silicon surface structures fabricated by femtosecond laser texturing

机译:飞秒激光织构化的宽带减反射硅表面结构

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摘要

In this study, the effects of laser fluence, scanning speed and texturing environment on reflectance of femtosecond laser textured silicon substrate are investigated. Microstructural analysis revealed the cause of variation of average reflectance with laser fluence and scanning speed. The densely packed flat surface structures are less efficient in trapping the light, thus exhibiting higher reflectance, while sparsely packed microstructures trap the incident light and lead to very low reflectance. The study also explores the effect of texturing media, wherein femtosecond laser texturing lead to formation of globular and elongated structures in air and water respectively. In advancement to previously reported results, this study demonstrates a wideband antireflection property of silicon substrate textured at an optimized condition.
机译:在这项研究中,研究了激光通量,扫描速度和纹理化环境对飞秒激光织构硅基板反射率的影响。显微组织分析揭示了平均反射率随激光能量密度和扫描速度变化的原因。密集堆积的平坦表面结构在捕获光方面效率较低,因此表现出较高的反射率,而稀疏堆积的微结构捕获入射光并导致非常低的反射率。该研究还探讨了纹理化介质的影响,其中飞秒激光纹理化分别导致空气和水中形成球状和细长结构。在先前报道的结果之前,该研究证明了在最佳条件下织构化的硅衬底的宽带减反射特性。

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