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首页> 外文期刊>Applied Surface Science >Angle- and polarization resolved antireflection properties of black silicon prepared by electrochemical etching supported by external electric field
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Angle- and polarization resolved antireflection properties of black silicon prepared by electrochemical etching supported by external electric field

机译:通过外部电场支持的电化学刻蚀制备的黑硅的角和偏振分辨抗反射特性

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摘要

Many attempts have been communicated so far to increase solar cell efficiencies, among them using randomly or regularly rough surfaces of active layers of solar cells. One of successful representatives of this kind is the so–called black silicon (b-Si). In this paper we report angular and polarization reflectance properties of b-Si samples prepared via electrochemical etching in HF:MeOH solution supported by external electric field. As different angular response of resulting rough Si-air interface to sunlight can be anticipated, the angle- and polarization resolved reflectance measurements of b-Si are recorded and correlated to the simulation results considering surface roughness of the samples and graded Si-air effective medium.
机译:迄今为止,已经进行了许多尝试来提高太阳能电池的效率,其中包括使用太阳能电池活性层的随机或规则粗糙表面。这种成功的代表之一就是所谓的黑硅(b-Si)。在本文中,我们报告了在外部电场支持下在HF:MeOH溶液中通过电化学蚀刻制备的b-Si样品的角和偏振反射特性。由于可以预见到粗制的Si-空气界面对日光的不同角度响应,因此记录了b-Si的角度和偏振分辨反射率测量值,并将其与模拟结果相关联,同时考虑了样品和渐变的Si-空气有效介质的表面粗糙度。

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