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机译:通过外部电场支持的电化学刻蚀制备的黑硅的角和偏振分辨抗反射特性
Institute of Aurel Stodola, Faculty of Electrical Engineering, University of Žilina;
Institute of Aurel Stodola, Faculty of Electrical Engineering, University of Žilina;
Department of Physics, Faculty of Electrical Engineering, University of Žilina;
Institute of Physics, Slovak Academy of Sciences;
Institute of Aurel Stodola, Faculty of Electrical Engineering, University of Žilina;
Department of Physics, Faculty of Electrical Engineering, University of Žilina;
Black silicon; Rough surface; Effective medium; Angle of incidence; Reflectance; Oblique;
机译:光电化学和电化学刻蚀制备的纳米/微结构硅层的形貌和光电性能研究
机译:光电化学和电化学刻蚀制备的纳米/微结构硅层的形貌和光电性能研究
机译:电化学刻蚀法制备多孔硅层的电性能研究
机译:通过电化学蚀刻制备多孔硅的温度依赖性和介电松弛
机译:通过热喷涂技术制备的压力淬火硅的电性能。
机译:膜电化学蚀刻制备的聚合物石墨尖端的场排放性能
机译:电化学蚀刻技术制备多孔硅的电性能研究