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Surface control of optical properties in silicon nanocrystals produced by laser pyrolysis

机译:激光热解制备的硅纳米晶体光学性质的表面控制

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Macroscopic quantities (g/h) of Si nanoparticles were prepared by laser pyrolysis of silane and showed photoluminescence (PL) emission in the range 700-1050 nm after oxidation in air at a temperature T >= 700 degrees C. Two different strategies were followed to reduce as-produced particle agglomeration which hinders most of the applications, namely etching with either acid or alkaline solutions. Well isolated single particles were detected after acid etching in HE Disaggregation was also achieved by the combined effect of the high power sonication and alkaline etching by tetra-methyl ammonium hydroxide (TMAH), which leaves OH terminated surfaces. However, in both cases re-aggregation was observed within a few hours after oxide removal. Stable dispersions of Si nanoparticles in different solvents were obtained by treatments of H-terminated surfaces with the surfactant TOPO (C24H51P=O, triOCtYlphospine oxide) and by treatment of OH-terminated surfaces with Na3PO4. (c) 2005 Elsevier B.V. All rights reserved.
机译:通过激光热解硅烷制备宏观数量(g / h)的硅纳米粒子,并在空气中于T> = 700摄氏度氧化后显示700-1050 nm范围内的光致发光(PL)发射。遵循两种不同的策略以减少阻碍大多数应用的成品颗粒附聚,即用酸或碱溶液蚀刻。在HE中进行酸蚀刻后,检测到分离良好的单个颗粒。通过高功率超声处理和四甲基氢氧化铵(TMAH)进行碱蚀刻的联合作用,也可以实现分解。然而,在两种情况下,在去除氧化物后数小时内都观察到了重新聚集。通过用表面活性剂TOPO处理H端接的表面(C24H51P = O,三OCtYlphospine氧化物)并用Na3PO4处理OH端接的表面,可以获得纳米粒子在不同溶剂中的稳定分散体。 (c)2005 Elsevier B.V.保留所有权利。

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