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Microstructure characterization of porous silicon as studied by positron annihilation measurements at low temperatures and high vacuum

机译:在低温和高真空下通过正电子an没测量研究的多孔硅的微观结构表征

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摘要

Atomic scale properties of thin porous silicon (PSi) layers, characterized by the formation of positronium, are investigated using positron annihilation lifetime spectroscopy in the temperature range 20-300 K under 10~(-7) Torr vacuum. The longest orthopositronium as well as the shortest parapositronium components are found to have quite low intensities in the thin layer at room temperature. It is also found that at temperatures ≤ 240 K, these two components do not show up in the spectrum. The reason for this absence of the longest lifetime component is suggested.
机译:利用正电子an没寿命光谱技术,在10〜(-7)Torr真空下,在20-300 K的温度范围内,研究了以形成正电子为特征的薄多孔硅(PSi)层的原子尺度性质。发现在室温下最长的正正电子和最短的正正电子组分在薄层中具有非常低的强度。还发现在≤240 K的温度下,这两个分量在光谱中不显示。建议没有这种最长寿命成分的原因。

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