Realization of controllable etching for ZnO film by NH_4Cl aqueous solution and its influence on optical and electrical properties

摘要

ZnO films were deposited on c-plane Al_2O_3 substrates by pulsed laser deposition. The etching treatments for as-grown ZnO films were performed in NH_4Cl aqueous solution as a function of NH_4Cl concentration and etching time. It was found that NH_4Cl solution is an appropriate candidate for ZnO wet etching because of its controllable and moderate etching rate. The influence of etching treatment on the morphology, optical and electrical properties of the ZnO films has been investigated systematically by means of X-ray diffraction, atomic force microscope, photoluminescence and Hall effect. The results indicated that the surface morphology and optical properties of the films were highly influenced by etching treatment.