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Electrical And Piezoresistive Properties Of Ion Beam Deposited Dlc Films

机译:离子束沉积Dlc薄膜的电和压阻特性

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In present study diamond like carbon (DLC) films were deposited by closed drift ion source from the acetylene gas. The electrical and piezoresistive properties of ion beam synthesized DLC films were investigated. Diode-like current-voltage characteristics were observed both for DLCSi and DLC/pSi heterostructures. This fact was explained by high density of the irradiation-induced defects at the DLC/Si interface. Ohmic conductivity was observed for DLCSi heterostructure and metal/DLC/metal structure at low electric fields. At higher electric fields forward current transport was explained by Schottky emission and Poole-Frenkel emission for the DLCSi heterostructures and by Schottky emission and/or space charge limited currents for the DLC/pSi heterostructures. Strong dependence of the diamond like carbon film resistivity on temperature has been observed. Variable range hopping current transport mechanism at low electric field was revealed. Diamond like carbon piezoresistive elements with a gauge factor in 12-19 range were fabricated.
机译:在本研究中,通过封闭的漂移离子源从乙炔气中沉积类金刚石碳(DLC)膜。研究了离子束合成DLC薄膜的电和压阻特性。对于DLC / nSi和DLC / pSi异质结构,都观察到了类似二极管的电流-电压特性。 DLC / Si界面处辐照引起的缺陷密度高可以解释这一事实。在低电场下观察到DLC / nSi异质结构和金属/ DLC /金属结构的欧姆电导率。在较高的电场下,通过DLC / nSi异质结构的肖特基发射和Poole-Frenkel发射以及DLC / pSi异质结构的肖特基发射和/或空间电荷限制电流来解释正向电流传输。已经观察到类金刚石碳膜电阻率对温度的强烈依赖性。揭示了低电场下的变程跳变电流传输机制。制作了尺寸系数在12-19范围内的类金刚石碳压阻元件。

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