机译:通过电感耦合等离子体CVD沉积的硅膜的光电特性
Department of Physics, Lanzhou University, Lanzhou 730000, China;
Department of Physics, Lanzhou University, Lanzhou 730000, China;
Department of Physics, Lanzhou University, Lanzhou 730000, China;
Department of Physics, Lanzhou University, Lanzhou 730000, China;
Department of Physics, Lanzhou University, Lanzhou 730000, China;
Department of Physics, Lanzhou University, Lanzhou 730000, China;
silicon films; substrate temperature; inductively coupled plasma; optoelectronic properties;
机译:电感耦合等离子体CVD沉积的低温氮化硅膜的沉积与表征
机译:H_2 /(H_2 + Ar)比对等离子体增强CVD沉积微晶硅膜的结构和光电性能的影响
机译:N_2O / SiH_4流量比对电感耦合等离子体化学气相沉积法制备非晶硅氧化物薄膜的影响及其在硅表面钝化中的应用
机译:在室温下电感耦合等离子体CVD沉积Si膜的结构和光学性质
机译:射频感应耦合等离子体沉积的类金刚石碳膜的表征和优化显微硬度
机译:在不加热衬底的情况下通过射频磁控等离子体溅射沉积的铝掺杂氧化锌薄膜的空间分辨光电性能
机译:射频电感耦合等离子体在金刚石状碳膜的化学气相沉积过程中的应用,用于改性沉积膜的性能