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Scattering effects of primary electrons in Co/Cu(111) measured by Auger; elastic and loss electrons

机译:俄歇测量的一次电子在Co / Cu(111)中的散射效应;弹性和损耗电子

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Electron energy losses were measured as a function of the incidence angle of the primary electron beam for the Co/Cu(111) adsorption system. The measurements performed for the clean and covered substrate reveal characteristic intensity maxima associated with the close packed rows of atoms, as it was observed in the so called directional Auger and directional elastic peak electron spectroscopy profiles. The incidence angle dependent signal of electron energy losses measured for the clean (Cu 3p_(3/2)) and covered (Co 3p_(3/2)) substrate gives the so called directional electron energy loss spectroscopy (DEELS) profiles which contain structural as well as chemical information. The scattering of primaries and different emission processes associated with electron energy losses, Auger, and elastically backscattered electrons are discussed. A change in the h_(Cu) (Cu M_(2.3) W transition) Auger signal recorded during the continuous cobalt deposition shows that the growth mode is not a pure layer by layer type. The complete covering of the substrate by Co at higher coverages is confirmed by the comparison between experimental and theoretical ratios of the Auger peak heights.
机译:电子能量损失是作为Co / Cu(111)吸附系统的一次电子束入射角的函数进行测量的。如在所谓的定向俄歇和定向弹性峰电子光谱图中观察到的,对干净和覆盖的基板进行的测量显示出与紧密排列的原子行相关的特征强度最大值。在干净的(Cu 3p_(3/2))和被覆盖的(Co 3p_(3/2))衬底上测得的电子能量损耗的入射角相关信号给出了所谓的定向电子能量损耗光谱(DEELS)曲线,其中包含结构以及化学信息。讨论了与电子能量损失,俄歇(Auger)和弹性反向散射电子相关的原色散射和不同的发射过程。在连续钴沉积过程中记录的h_(Cu)(Cu M_(2.3)W跃迁)俄歇信号的变化表明,生长模式不是逐层纯的。通过实验和理论俄歇峰高之比的比较,可以确定钴在较高覆盖率下完全覆盖了基底。

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