机译:6H-SiC上Ni基肖特基接触的热降解
Department of Solid State Engineering, Faculty of Chemical Technology, Institute of Chemical Technology, Prague, Technicka 5,166 28 Prague 6, Czech Republic;
Department of Solid State Engineering, Faculty of Chemical Technology, Institute of Chemical Technology, Prague, Technicka 5,166 28 Prague 6, Czech Republic;
Department of Solid State Engineering, Faculty of Chemical Technology, Institute of Chemical Technology, Prague, Technicka 5,166 28 Prague 6, Czech Republic;
Central Laboratories, Institute of Chemical Technology, Prague, Technicka 5,166 28 Prague 6, Czech Republic;
SiC,Nickel,Nickel silicide,Schottky diode,Ohmic contact,Low doping level;
机译:Ru,Pd和Al肖特基触头对p型6H-SiC的热稳定性
机译:Re Schottky触头对6H-SiC的热稳定性
机译:GaN和Al_(0.31)Ga_(0.69)N上基于Pt和Ni的肖特基接触的热稳定性
机译:Ru,Pd和Al肖特基触头对p型6H-SiC的热稳定性
机译:热稳定的欧姆和肖特基接触氮化镓。
机译:van der WALS金属半导体 - 金属结构的不对称肖特基触点基于二维Janus材料
机译:Ti / Pt / Au Schottky接触的热降解机理到N型GaAs