...
机译:射频磁控溅射合成非晶碳纳米棒的电化学特性
Department of Electronic and Computer Engineering, National Taiwan University of Science and Technology, No. 43, Sec. 4, Keelung Road, Taipei 10607, Taiwan;
Graduate Institute of Electro-Optical Engineering, National Taiwan University of Science and Technology, No. 43, Sec. 4, Keelung Road, Taipei 10607, Taiwan;
Department of Electronic and Computer Engineering, National Taiwan University of Science and Technology, No. 43, Sec. 4, Keelung Road, Taipei 10607, Taiwan;
Graduate Institute of Electro-Optical Engineering, National Taiwan University of Science and Technology, No. 43, Sec. 4, Keelung Road, Taipei 10607, Taiwan;
Graduate Institute of Electro-Optical Engineering, National Taiwan University of Science and Technology, No. 43, Sec. 4, Keelung Road, Taipei 10607, Taiwan;
Department of Electronic and Computer Engineering, National Taiwan University of Science and Technology, No. 43, Sec. 4, Keelung Road, Taipei 10607, Taiwan;
Graduate School of Engineering, University of Hyogo, Himeji, Hyogo 671-2280, Japan;
Department of Electronic and Computer Engineering, National Taiwan University of Science and Technology, No. 43, Sec. 4, Keelung Road, Taipei 10607, Taiwan,Graduate Institute of Electro-Optical Engineering, National Taiwan University of Science and Technology, No. 43, Sec. 4, Keelung Road, Taipei 10607, Taiwan;
Department of Electronic and Computer Engineering, National Taiwan University of Science and Technology, No. 43, Sec. 4, Keelung Road, Taipei 10607, Taiwan,Graduate Institute of Electro-Optical Engineering, National Taiwan University of Science and Technology, No. 43, Sec. 4, Keelung Road, Taipei 10607, Taiwan;
Amorphous carbon nanorod; Radio frequency magnetron sputtering; Electric double layer capacitor; Graphene; Raman spectroscopy; Transmission electron microscopy;
机译:射频磁控溅射技术合成的ZnS纳米棒的场发射
机译:射频溅射合成非晶碳薄膜中的四面体和三角碳原子杂化
机译:射频溅射合成非晶碳薄膜中的四面体和三角碳原子杂化
机译:通过射频磁控溅射合成的多晶碳氮化物P-C3N4
机译:磁控溅射合成氮化碳基超晶格和二硼化钛基复合膜的结构,力学和摩擦学性能。
机译:射频直流和射频叠加直流磁控溅射沉积的透明导电掺铝ZnO多晶薄膜的载流子输运和晶体学取向特征
机译:射频磁控溅射和电子束辐射合成溅射参数对二硫薄膜的影响