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Mechanisms of growth, properties and degradation of amorphous carbon films by closed field unbalanced magnetron sputtering on stainless steel bipolar plates for PEMFCs

机译:PEMFC不锈钢双极板上封闭场不平衡磁控溅射对非晶碳膜生长,性能和降解的机理

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Stainless steel bipolar plates possess good manufacturability, low costs, but inadequate interfacial conductivity and corrosion resistance in proton exchange membrane fuel cells (PEMFCs). Amorphous carbon films have been deposited on stainless steel as a function of bias voltage through closed field unbalanced magnetron sputtering ion plating system (CFUMSIP) to enhance the interfacial conductivity and corrosion resistance. Surface and cross-section morphologies, hybridization, interfacial conductivity, corrosion resistance and degradation mechanisms of a-C films were systemically investigated and results are very sensitive to the substrate bias voltage. The compactness and hybridization sp(2)/sp(3) ratio have parabolic relation with the substrate bias voltage and the a-C film deposited with 120 V has the densest cross structure and maximum sp(3) percentage. Various electrochemical corrosion tests in the simulated PEMFCs cathode environment confirm the fact corrosion resistance is closely related to the film compactness and hybridization. Then a-C film prepared at bias voltage 120 V has the lowest corrosion current density. The initial interfacial contact resistance (ICR) of a-C is a combination result of sp(2) percentage and film compactness and the samples deposited with bias voltage 60 V and 300 V have much lower ICR values than DOE target. Afterwards, the ICR increase mechanism of a-C film after electrochemical corrosion tests is illustrated through Raman and XPS detection, and the results reveal that increased oxygen content adsorbed on the film surface contributes to the increase of ICR value. (C) 2017 Published by Elsevier B.V.
机译:不锈钢双极板具有良好的可制造性,低成本,但在质子交换膜燃料电池(PEMFC)中界面导电性和耐腐蚀性不足。通过闭合场不平衡磁控溅射离子镀系统(CFUMSIP),非晶碳膜已作为偏置电压的函数沉积在不锈钢上,以增强界面导电性和耐腐蚀性。系统地研究了a-C膜的表面和横截面形态,杂化,界面电导率,耐腐蚀性和降解机理,结果对衬底偏置电压非常敏感。紧密度和杂化度sp(2)/ sp(3)的比率与衬底偏置电压呈抛物线关系,以120 V沉积的a-C膜具有最致密的交叉结构和最大sp(3)百分比。在模拟的PEMFC阴极环境中进行的各种电化学腐蚀测试证实,耐腐蚀性与薄膜致密性和杂化密切相关。然后,以120 V偏置电压制备的a-C膜具有最低的腐蚀电流密度。 a-C的初始界面接触电阻(ICR)是sp(2)百分比和薄膜致密性的综合结果,用60 V和300 V偏置电压沉积的样品的ICR值比DOE目标低得多。然后,通过拉曼和XPS检测说明了电化学腐蚀试验后a-C膜的ICR增加机理,结果表明,吸附在膜表面的氧含量的增加有助于ICR值的增加。 (C)2017由Elsevier B.V.发布

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