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首页> 外文期刊>Applied Surface Science >Atomic structure and potential energy of β-Si_3N_4/diamond interface in the process of detachment: A first-principles study
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Atomic structure and potential energy of β-Si_3N_4/diamond interface in the process of detachment: A first-principles study

机译:β-Si_3N_4/金刚石界面在脱离过程中的原子结构和势能:第一性原理研究

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摘要

HighlightsRapid changes in distance and energy occur in the processing of detachment.Interfacial bonds are broken, but interface still has a large adhesive strength.Alternation between vdW and quantum effects leads to the discontinued force fields.A transient and unstable stage maybe exist during the detachment of the interface.AbstractPeeling is regarded as a main technique barrier for the application of coating. Many factors affects the peeling of coating. Among them, the interfacial properties between coating and substrate plays a vital role. In this work, theβ-Si3N4/diamond interface is conducted as the sample to study the changes in atomic structure and potential energy in the process of detachment by the first-principles calculations. Theβ-Si3N4/diamond (2×2) crystal unit is used as the calculated model. The detachment is simulated by moving upβ-Si3N4far from diamond by the 0.1Å of each step. The results show that in the beginning of detachment, the bonds in the interface keep a constant length, rather than extension like spring. When the distance betweenβ-Si3N4and diamond reaches a certain distance, the interfacial bonds would suddenly break, and the elongatedβ-Si3N4resumes its original statues indicating that the interface between two surfaces may exist a threshold value to control the peeling. When the external force is less than this threshold value, the peeling of coating would not occur. However, once the external force is greater than this one, the peeling would immediately present. The interface presents the brittle failure in the process of detachment, which is in good agreement with the experimental observation. Meanwhile, the different physical properties between van der Waals and quantum effects lead to the transient status in the process of detachment, where although the interfacial bonds are broken, the adhesive strength is still strong due to its low negative adsorption energy.
机译: 突出显示 在分离过程中,距离和能量会快速变化。 界面键已断开,但界面仍然具有较大的粘合强度。 替代在vdW和量子效应之间产生了不连续的力场。 短暂而不稳定的舞台在界面分离期间存在。 摘要 < ce:simple-para id =“ spar0030” view =“ all”>剥皮被认为是涂覆涂料的主要技术障碍。许多因素影响涂层的剥离。其中,涂层与基材之间的界面性能起着至关重要的作用。在这项工作中,β -Si 3 N 4 /金刚石界面为样本,通过第一性原理计算研究了原子在分离过程中原子结构和势能的变化。 β -Si 3 N 4 / diamond(2×2)晶体单位用作计算模型。通过向上移动β -Si 3 N 4来模拟脱离距钻石每步0.1Å的距离。结果表明,在分离开始时,界面中的键保持恒定的长度,而不是像弹簧那样延伸。当β -Si 3 N 4 和钻石到达一定距离,界面键会突然断裂,并且细长的β -Si 3 N 4 恢复其原始状态,表示两个表面之间的界面可能存在阈值以控制剥离。当外力小于该阈值时,不会发生涂层剥离。但是,一旦外力大于该力,就会立即出现剥离。该界面在分离过程中表现出脆性破坏,与实验观察结果吻合良好。同时,范德华力和量子效应之间的不同物理性质导致了分离过程中的瞬态状态,尽管界面键断裂,但由于其负吸附能低,其粘合强度仍然很强。

著录项

  • 来源
    《Applied Surface Science》 |2018年第15期|211-214|共4页
  • 作者单位

    School Energy and Mechanical Engineering, Shanghai University of Electric Power,Shanghai Key Laboratory of Materials Protection and Advanced Materials in Electric Power;

    School Energy and Mechanical Engineering, Shanghai University of Electric Power;

    School Energy and Mechanical Engineering, Shanghai University of Electric Power;

    School Energy and Mechanical Engineering, Shanghai University of Electric Power;

    School Energy and Mechanical Engineering, Shanghai University of Electric Power;

    School Energy and Mechanical Engineering, Shanghai University of Electric Power;

    Global Energy Interconnection Research Institute;

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  • 原文格式 PDF
  • 正文语种 eng
  • 中图分类
  • 关键词

    Interface; Diamond; β-Si3N4; Detachment; Adhesive energy;

    机译:界面;金刚石;β-Si3N4;剥离;黏附能;

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