Fabrication of three-dimensional microstructures in positive photoresist through two-photon direct laser writing

摘要

Three-dimensional (3D) microstructures with micron scale are fabricated in photoresist using two-photon direct laser writing with an infrared femtosecond laser at 800 nm. The positive photoresist of Novolak/diazonaph-thoquinone (DNQ) is used for the fabrication of line structures and 3D microstructures. Linewidths of line structures are fabricated with laser power ranging from 1 to 15 mW and scanning speeds ranging from 5 to 50 μm s~(-1). The obtained linewidth is analyzed using an exposure kinetics model of DNQ for two-photon absorption. Both 3D inversed woodpile structures and helical structures are fabricated.